SMART SiN^TM Grids

Cross-section and top-down views of SMART SiN Grids with four 60 x 100 um windows.

In response to our customer’s demand for reduced background, Dune Sciences is proud to now offer the industry’s thinnest silicon nitride membrane grids for high resolution imaging of low contrast materials using TEM. Dune Sciences’ SMART SiN Grids employs state-of-the art microfabrication techniques that allow for the deposition of 5-7 nm stoichiometric low stress silicon nitride (Si₃N₄) membrane windows on sturdy Si substrates to provide the lowest background of any silicon-based membrane grids. The nitride membranes are chemically resistant and surprisingly robust given their extreme thin-ness. SMART SiN Grids are an excellent choice for materials including single-walled carbon nanotubes, carbon black, latex spheres, virus-like particles, dendrimers, as well as a range of inorganic materials and particles.

As with Dune’s SiO₂ membrane SMART Grids, SMART SiN Grids can be used in a variety of applications and with an assortment of analytical methods. SMART SiN Grids are available with the native (non-functionalized) nitride membrane. In addition, Dune Sciences has developed proprietary processing technology that allows us to access many of the same surface functionalities that we offer for our SiO2 membranes. SMART SiN Grids are the preferred substrate for electron energy loss spectroscopy due to their low absorption, but can also be used with SEM, STEM, AFM, and other surface analytical techyniques.

SMART SiN grids are currently only offered in one grid geometry. The grids are 3.8 mm square and 300 μm thick with four 60 x 100 μm nitride membranes that are 5-7 nm in thickness. The grids will fit in some, but not all standard TEM holders with some special handling requirements. Please contact Dune Sciences today to ensure this product is compatible with your instrument.